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NPI Series of Media-Isolated Pressure Sensors


 

The NovaSensor NPI Series features a high stability SenStable® piezoresistive MEMS chip placed in a stainless steel media-isolated package. Ideal for use in hostile environments, the modular design allows for a variety of pressure port modules that are hermetically welded to the sensor header. The sensors monitor pressure in industrial, medical and transportation applications by producing a voltage output that is linearly proportional to the input pressure.

NovaSensor_NPA_Surface_Mount_Pressure_Sensors-group-1

Features:

  • Pressure Range: 2.5 psi (17 kPa) to 5,000 psi (35,000 kPa)
  • High stability and reliability
  • Gauge, absolute and sealed gauge variants
  • Stainless Steel 316L package for corrosive media compatibility
  • HEX Diameter: 15 mm / 19 mm
  • Current or voltage-driven
  • Operating Temperature Range: -40°F to 257°F (-40°C to 125°C)
  • Total Error Band: ±1% FSO*
  • Outputs: Analog (mV) or Digital (I2C, coming soon)
  • Custom configurations and pressure ranges available

  Applications:

  • Industrial process control
  • Corrosive fluid and gas measurement
  • Hydraulic systems and valves
  • Tank level measurement
  • Barometric pressure measurement
  • Ship and marine systems
  • Aircraft and avionic systems
  • Medical equipment

   * Total Error Band comprises offset, full scale span, non-linearity, hysteresis, non-repeatability, all thermal effects. Valid for released products.

 

Specifications
Operating Temperature Range -40°F to 257°F (-40°C to 125°C)
Compensated Temperature Range 32°F to 158°F (0°C to 70°C)
Vibration 10 gRMS (20 to 2000 Hz)
Shock 100 g (11 milliseconds)
Life (Dynamic Pressure Cycle) 10 x 106 cycles
Parameter Typical Notes
Bridge Impedance 5000 ohm 20%
Over Pressure 2x 3x (5 and 2.5 psi)
Linearity 0.1 FSO BFSL

Consult individual product datasheets for additional specifications.

 

NPI Series Products:

Product Information Ordering


Amphenol industrial sensors can be custom-designed to meet the exact specifications and demands of the application.